Solution Deposition Precursors
Bis(ethylcyclopentadienyl)chromium(II)
Cupric acetate monohydrate
Cobalt(II) acetate tetrahydrate
tetraamminepalladium(ii) acetate
Manganese(II) acetate tetrahydrate
Europium(III) acetate hydrate
Rhodium(II) trimethylacetate dimer, 99.9+% metals basis
ZIRCONIUM DI-N-BUTOXIDE (BIS-2,4-PENTANEDIONATE)
Acetylacetone Lanthanum(III)
Neodymium(III) acetylacetonate hydrate
PALLADIUM(II) HEXAFLUOROACETYLACETONATE
Acetic acid, copper(2+)salt, hydrate (9CI)
2-Propanol,ytterbium(3+) salt (9CI)
