Photoresists Raw Materials
(4-IODOPHENYL)DIPHENYLSULFONIUM TRIFLATE
2-(Perfluorooctyl)ethyl Acrylate
2-Propenoic acid,2,2,3,3,4,4,5,5,6,6,7,7-dodecafluoroheptyl ester
N-HYDROXY-5-NORBORNENE-2 3-DICARBOXIMID&
[TRIS(DIMETHYLPHENYLPHOSPHINE)](2,5-NORBORNADIENE)RHODIUM(I) HEXAFLUOROPHOSPHATE
2,2,3,3,4,4,5,5-oCtafluoropentyl methacrylate
2,2,3,3,3-Pentafluoropropyl acrylate
4,4'-(1,3-Adamantanediyl)bisphenol
Octafluoropentyl acrylate
2-(TRIFLUOROMETHYL)ACRYLIC ACID
3-(Perfluoro-n-oCtyl)propenoxide
1,3-Adamantanedicarboxylic Acid
2-(4-Methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine
Hexadecyltrimethylammonium hydroxide
5-(2-ADAMANTYLIDENE)-2,2-DIMETHYL-1,3-DIOXANE-4,6-DIONE
3-Oxabicyclo[3.1.0]hexane-2,4-dione
RHODIUM(I) HEXAFLUOROPHOSPHATE](https://resource.bocsci.com/structure/32761-50-5.gif)
![3-Oxabicyclo[3.1.0]hexane-2,4-dione](https://resource.bocsci.com/structure/5617-74-3.gif)
