Photoresists Raw Materials
Triphenylsulfonium Nonafluorobutane-1-sulfonate
(4-TERT-BUTYLPHENYL)DIPHENYLSULFONIUM TRIFLATE
Dimethyl 1,3-adamantanedicarboxylate
(4-FLUOROPHENYL)DIPHENYLSULFONIUM TRIFLATE
3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Heneicosafluorododecyl acrylate
1,3-Adamantanediacetic acid
(TERT-BUTOXYCARBONYLMETHOXYPHENYL)DIPHENYLSULFONIUM TRIFLATE
(4-METHYLTHIOPHENYL)METHYL PHENYL SULF&
Bis(4-tert-butylphenyl)iodonium perfluoro-1-butanesulfonate
1,1,3,3-TETRAMETHYL-1,3-BIS(2-(5-NORBORN
Oxirane,2-[(2,2,3,3-tetrafluoropropoxy)methyl]-
Oxirane,[[(2,2,3,3,4,4,5,5-octafluoropentyl)oxy]- methyl]-
N-hydroxy-5-norbornene-2.3-dicarboxylimide
Di(ethylene glycol) dimethacrylate
TetrahydroFurfuryl acrylate
(4-Phenoxyphenyl)diphenylsulfonium triflate
Tris[4-(tert-butyl)phenyl]sulfonium Nonafluorobutane-1-sulfonate
Methyl-5-norbornene-2,3-dicarboxylic anhydride
(4-IODOPHENYL)DIPHENYLSULFONIUM TRIFLATE